WATER COLOUR & ACCRILIC | TiTin Gallery, Water colour & Accrilic, Rice paper, Back & White, Water Colour, Gallery Hoi An, Hoi An Gallery, Art Hoi An, Hoi An Art, Art Gallery, Gallery Art, Asia art, Vietnam artists, Fine art, Art, Artworks, Paintings, original paintings
It IlIRite 'i on tihe ( i ti n tin '. o 01Chit Fintnt1( ' .. "nil tin lii .c'plir'd fci o( it fh hl 'c 1g. , uni tieP'-o. Sin) ;e ulle nce Iii wlfN I Nay liii. i ,!: ) i d lli tl s , Ih,'e it' tI ie Ilolive ) ...
A single chamber of a vapor deposition system is used to deposit both Ti and TiN, subsequent to deposition of Al or Al alloy. Because such layers are deposited in the same chamber, the process requires fewer handling steps than the conventional process, thereby increasing throughput. Still further, only three physical vapor deposition chambers of the four of the apparatus are used, thereby allowing the fourth chamber to be used for other deposition.
A single chamber of a vapor deposition system is used to deposit both Ti and TiN. A Ti layer is deposited on the sample using a noncollimated process. N.sub.2 gas is then introduced in the chamber. A TiN layer is then deposited over the Ti layer. A second Ti layer is deposited over the TiN layer. A separate Ti pasting of a TiN chamber is eliminated, thereby increasing throughput. Further, only three physical vapor deposition chambers are used, thereby allowing the fourth chamber to be used for other metal deposition. Moreover, the second Ti layer eliminates the first wafer effect and reduces sheet resistance relative to a same chamber Ti/TiN underlayer. Lastly, the Al deposited on this new stack has a stronger <111> crystallographic texture, which leads to better electromigration resistance.