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Munro's Electron Beam Software | Team
mebs.co.uk
Genya Matsuoka. LeNa Systems – Japan. Read more... Marian Mankos is a senior research scientist and electron-optical designer with more than 30 years of ...
Related Documents
Competitors crowd into photomask tool segments, setting stage for...
www.eetimes.com
MONTEREY, Calif. -- There's good and bad news in the photomask-equipment arena. While the business is expected to be growing over the next several years, the...
Hitachi to ship next-generation e-beam mask tool in mid | EE...
www.eetimes.com
MONEREY, Calif. -- During the annual BACUS Symposium on Photomask Technology today, Japan's Hitachi Ltd. gave a sneak preview of its next-generation...
Miscellaneous
DE D Electron beam lithography method - Google Patents
patents.google.com
... DE D1, DE D1, DE Inventors, Yoshinori Minamide, Genya Matsuoka, Hiroyoshi Ando. Applicant, Hitachi Ltd.
EP A1 - Elektronenstrahl-Lithographieverfahren
patents.google.com
... EP A1, EP A1, EP , EP Inventors, Yoshinori Minamide, Genya Matsuoka, Hiroyoshi Ando. Applicant, Hitachi, Ltd.
Improved image placement performance of HL-7000M
www.spiedigitallibrary.org
SPIE Digital Library Proceedings
Nedo Datasheets, Manuals, Linecards, Case Studies, & PDFs
www.industrycortex.com
... (pdf Format, 86kbyte). http://www.hitachi.com ... and Industrial Technology Development Organization (NEDO). ABOUT THE AUTHORS Genya Matsuoka .
DE T Electron beam lithography method - Google Patents
patents.google.com
Inventors, Yoshinori Minamide, Genya Matsuoka, Hiroyoshi Ando. Applicant, Hitachi Ltd. Export Citation, BiBTeX, EndNote, RefMan. Classifications (5). External ...
EP B1 - Electron beam lithography method Google...
patents.google.com
Inventors, Yoshinori Minamide, Genya Matsuoka, Hiroyoshi Ando. Applicant, Hitachi, Ltd. Export Citation, BiBTeX, EndNote, RefMan. Classifications (5), Legal ...
US A - Method and apparatus of fabricating electric circuit...
patents.google.com
A thick and thin film hybrid multilayer wiring substrate includes an adjustment layer provided between a thick film circuit and a thin film circuit in...
MICRO: Semicon Europa Technical Programs
micromagazine.fabtech.org
Electron Beam Mask Writer Now and Future Genya Matsuoka, Hitachi High-Technologies. Advanced E-Beam Lithography System for Next-Generation Masks
Silicon Investor (SI) -- The First Internet Community
www.siliconinvestor.com
... an improved data-transfer rate, said Genya Matsuoka, senior engineer for Hitachi's Instruments Division, in a presentation at the event today.
US A - Electron beam lithography method Google...
patents.google.com
A sample stage is moved so that an alignment mark on a wafer successively move on positions symmetric to the positional origin of the electron beam, and...
US A - Electron beam lithography system Google...
patents.google.com
An electron beam lithography apparatus, comprising an electron beam source for irradiating an electron beam on a specimen surface, a deflectional...
US A - Method and system for measuring the diameter of an...
patents.google.com
A method of measuring the diameter of an electron beam in which the electron beam diameter is measured from the leading edge or trailing edge of a...
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