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Gert Leusink, Rexford, Ferry Dr
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Gert J Leusink, 56, Fishkill, Schuyler Blvd
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Gert Leusink - Salt Point
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Gert Leusink - Salt Point. The +Address of Gert Leusink is Netherwood Road, Salt Point. Result for Gert Leusink in City Salt Point of the State New York...
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LinkedIn: Gert Leusink | LinkedIn
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Interests
Gert Leusink - Patents
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Gert Leusink patents Recent bibliographic sampling of Gert Leusink patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):
Fit Fun Triatlon Noordoostpolder
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85, 298, Gert Leusink, IJSSELMUIDEN, M, 00:15:22, 00:02:51, 00:40:44, 00:58:56, 00:01:14, 00:12:15, 00:11:58, 00:24:13, 01:24:22.
Gert Leusink, Inventor, Tempe, AZ, US
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Gert Leusink's Inventor profile, Salt Point, NY, US, GLOBALFOUNDRIES INC.;TOKYO ELECTRON LIMITED;, 27 patents/applications from Aug 19, to Sep 24, 2010,...
Marathon Eindhoven | Uitslag Gert Leusink
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Naam, Gert Leusink. Woonplaats / Vereniging, Eindhoven. Afstand, Halve marathon. Categorie, M45. Totaal plaats, Categorie plaats,
Business Profiles
patentbuddy: Gert Leusink
TOKYO ELECTRON LIMITED, Saltpoint, NY, US
patentbuddy: Gert J Leusink
TOKYO ELECTRON LIMITED, Saltpoint, NY, US
Just a moment...
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View Gert Leusink's business profile as Director Process Technology, Senior Member Technical Staff at Tokyo Electron Limited and see work history, affiliations...
Gert Leusink | Salt Point, New York
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Get information about Gert Leusink located in Salt Point, New York, United States. Who called you at (845) ?
Private Homepages
(PDF) Electrical properties of Ti/TiN films prepared by chemical...
www.academia.edu
Titanium nitride films were prepared by low pressure chemical vapor deposition from TiCl4 and NH3 at 630°C. Metallic Ti films were deposited from TiCl4 and H2...
Bad news
findagrave: Leusink, Gertrude Jeanette Den Herder
, Sioux Center (Sioux County, Iowa)
Books & Literature
Gert J. Leusink | XanEdu Customization Platform
www.academicpub.com
Systematic study of the effect of La2O3 incorporation on the flatband voltage and Si band bending in the TiN/HfO2/SiO2/p-Si stack American Institute of ...
Advanced Gate Stack, Source/drain, and Channel Engineering for...
books.google.ca
, copyright The Electrochemical Society Control of Material Interactions in Advanced High-κ Metal Gate Stacks Cory Wajda,a Gert Leusink,a ...
Related Documents
Gert Leusink - Academia.edu
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Physical and Electrical Effects of the Dep-Anneal-Dep-Anneal (DADA)...
ma.ecsdl.org
and Gert Leusink Physical and Electrical Effects of the Dep-Anneal-Dep-Anneal (DADA) Process for HfO 2 in High K/Metal Gate Stacks ECS Trans (4): ; doi: Abstract Full Text (PDF) | ...
Reliability of ALD Hf1-XZrxO2 Deposited by Intermediate Annealing or...
ecst.ecsdl.org
Gert Leusink b; a New Jersey Institute of Technology b TEL Technology Center, America Abstract. The reliability of atomic layer deposited ...
Effect of Al Doping on the Reliability of ALD HfO2
ma.ecsdl.org
Mdnasiruddin Bhuyian,; Durga Misra,; Kandabara Tapily,; Robert Clark,; Steve Consiglio,; Cory Wajda,; G. Nakamura and; Gert Leusink. + Author Affiliations.
Publications
Dr. Gert Leusink : SPIE.org Profile
spie.org
SPIE Profile : Dr. Gert Leusink - TEL Technology Ctr America LLC - the International Society for Optics and Photonics.
Reports & Statements
236th ECS Meeting Topic Close-up: Atomic Layer Deposition...
www.electrochem.org
This symposium contains cutting edge research results on applications in Atomic Layer Processing. Abstract deadline: April 12,
BALD Engineering - Born in Finland, Born to ALD: RASIRC® BRUTE®...
www.blog.baldengineering.com
... control, Steven Consiglio, Robert Clark, Takahiro Hakamata, Kandabara Tapily, Cory Wajda, Gert Leusink, Presentation at ALD2016 Ireland.
Miscellaneous
Gert Leusink | LinkedIn
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View Gert Leusink's professional profile on LinkedIn. LinkedIn is the world's largest business network, helping professionals like Gert Leusink discover inside ...
EP B1 - Method of passivating a cvd chamber Google...
patents.google.com
Inventeurs, Michael S. Ameen, Joseph T. Hillman, Gert Leusink, Michael Ward, Tugrul Yasar. Déposant, Tokyo Electron Limited. Exporter la citation, BiBTeX, ...
US B2 - Method for fabricating a semiconductor device...
patents.google.com
A method for treating a gate stack in the fabrication of a semiconductor device by providing a substrate containing a gate stack having a dielectric...
US A - Use of TiCl4 etchback process during integrated...
patents.google.com
Inventors, Michael S. Ameen, Gert Leusink, Joseph T. Hillman. Original Assignee, Tokyo Electron Limited. Export Citation, BiBTeX, EndNote, ...
Gert Leusink in Salt Point, NY - Listing Details - Yellow Pages...
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Gert Leusink is located in Salt Point NY according to public information records. First Name, Phone Number, Name Origin and Meaning for the person identified...
Gert Leusink hebben wij gevonden op wiezoekje - Foto's, Weblinks, De...
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Zoek wie je kwijt bent op WieZoekJe! WieZoekJe: Gert Leusink - Foto's, Weblinks, De Telefoongids / Gouden Gids, Youtube en nog veel meer. address city gert...
WO A1 - Method and apparatus for removing material from...
patents.google.com
Inventors, Emmanuel Guidotti, Gert Leusink, Takenao Nemoto. Applicant, Emmanuel Guidotti, Gert Leusink, Takenao Nemoto, Tokyo Electron Arizona Inc, Tokyo ...
US B2 - Method for processing a substrate Google...
patents.google.com
A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic...
WO A3 - Low-temperature dielectric formation for devices...
patents.google.com
A method of forming a semiconductor device includes providing a substrate in a vacuum processing tool, the substrate having a strained Ge- containing...
2nd Area-selective deposition workshop (ASD 2017) – Flashback –...
www.atomiclimits.com
· Gert Leusink from TEL discussed that the patterning paradigm is shifting to self-alignment and bottom-up approaches whereas Son Van Nguyen from IBM reported the state of the art of selective metal CVD processes being (nearly) implemented in fabs.
ALD/ALE | Conference presentations | Tokyo Electron Ltd.
www.tel.com
1, Steven Consiglio‚ Robert Clark‚ Cory Wajda‚ and Gert Leusink (TEL Technology Center‚ America‚ LLC) 2, Du Zhang‚ Yu-Hao Tsai‚ Yanxiang Shi‚ and Mingmei Wang (TEL Technology Center‚ America‚ LLC)
US B1 - Method of passivating and stabilizing a Ti-PECVD...
patents.google.com
A methodology is described by which a processing chamber used to deposit plasma-enhanced Ti-CVD films may be conditioned and passivated efficiently after...
Advance Program | PROGRAM | EDTM | 2nd Electron Devices ...
ewh.ieee.org
Thin Film Process Technologies for Continued Scaling, Robert Clark, Tapily Kanda, Kai-Hung Yu, Takahiro Hakamata, Steve Consiglio, David O'Meara, Cory Wajda, Jeffrey Smith, and Gert Leusink, TEL Technology Center, America, LLC. 6A-2 11:05-11:30 (Invited)
224th ECS Meeting (October 27 – November 1, 2013) - Confex
ecs.confex.com
224th ECS Meeting (October 27 – November 1, 2013) October November 01, Menu. Search Gert Leusink , TEL Technology Center, America. Abstract: E
New developments in area selective deposition – Take-home ...
www.atomiclimits.com
· ASD has the potential to eliminate this bottleneck by enabling self-aligned fabrication, which was described by Gert Leusink from TEL as a change of the patterning paradigm (see Figure 2). In-self-aligned fabrication, the starting point is a partially-processed device structure that has already been patterned in an earlier process step.
Area Selective Deposition Workshop 2017
www.nanomanufacturing.nl
Jean-Marc Girard (Air Liquide); Gert Leusink (TEL); David Thompson (Applied Materials). Poster session covering nucleation, selective deposition, and ...
SEMATECH Symposium Japan セミコンポータル: …
www.semiconductorportal.com
Gert Leusink, Director, Advanced Gate Stack and Back End Metal Development, Senior Member Technical Staff - TEL Technology Center America <Abstract - <CV - Ir Degree Metallurgy (Delft Univ of Techn.) Ph.D. Applied ...
Old, and unique, farmhouse in Vischers Ferry | The Daily ...
dailygazette.com
Old, and unique, farmhouse in Vischers Ferry ... Anouk Booneman and her husband Gert Leusink decided to take a last-minute look at an old home in Vischers Ferry. Though they …
Electrical Enhancement and Higher-K Engineering in Ultra-Thin Atomic...
jss.ecsdl.org
Gert Leusink, and A.C Diebold; Higher-K Formation in Atomic Layer Deposited Hf 1-X Al x O y Meet. MA (30): Abstract « Previous | Next ...
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Control of Material Interactions in Advanced High-κ Metal Gate Stacks. Cory Wajda,a Gert Leusink,a Koji Akiyama,b Shigeo Ashigaki,b Shintaro Aoyama,b Kouji.
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