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ICICDT : IEEE International Conference on IC Design &...
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ICICDT : IEEE International Conference on IC Design & Technology
Microplasma thruster for ultra-small satellites: plasma chemical and...
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Abstract: A microplasma thruster has been developed of electrothermal type using azimuthally... | Article from Pure and Applied Chemistry September 1, 2008
Network Profiles
LinkedIn: Koji Eriguchi - LinkedIn
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Interests
Koji ERIGUCHI - Patents
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Koji ERIGUCHI patents Recent bibliographic sampling of Koji ERIGUCHI patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):
Business Profiles
Researchgate: Koji Eriguchi
Kyoto, Kyoto, Japan
patentbuddy: Koji ERIGUCHI
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Books & Literature
Application of Molecular Dynamics Simulations to Plasma Etch Damage...
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Application of Molecular Dynamics Simulations to Plasma Etch Damage in Advanced Metal-Oxide-Semiconductor Field-Effect Transistors - Author Details |...
th International Symposium on Plasma- and Process-Induced...
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This text covers topics including; damage mechanism and modelling; antenna effect and process monitoring; high-K gate dielectric; and integration.
Koji Eriguchi | XanEdu Customization Platform
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Author: Koji Eriguchi. Results. Field and polarity dependence of time-to-resistance increase in FeO films studied by constant voltage stress method.
th International Symposium on Plasma- and Process-Induced ...
clevnet.library.link
th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA, Terence Hook, Koji Eriguchi, and Calvin T.
Related Documents
Comprehensive Modeling of Threshold Voltage Variability Induced by...
ui.adsabs.harvard.edu
Koji Eriguchi,; Yoshinori Nakakubo,; Asahiko Matsuda,; Masayuki Kamei,; Yoshinori Takao,; Kouichi Ono,. Affiliation: AA(Graduate School of Engineering, Kyoto ...
Eriguchi, Koji [WorldCat Identities]
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Publication Timeline . Most widely held works by Koji Eriguchi th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, ...
Scientific Publications
Thin Solid Films | 22nd Symposium on Plasma Science for Materials...
www.sciencedirect.com
Masayuki Kamei, Yoshinori Nakakubo, Koji Eriguchi, Kouichi Ono. Download PDF ... Hirotaka Tsuda, Masahito Mori, Yoshinori Takao, Koji Eriguchi, Kouichi Ono.
Influence of microwave annealing on optical and NCBIwww.ncbi.nlm.nih.gov › pmc › articles › PMC
www.ncbi.nlm.nih.gov
... of microwave annealing on optical and electrical properties of plasma-induced defect structures in Si substrate. Takaaki Iwai, Koji Eriguchi, [.
dblp: Koji Eriguchidblp.org › Persons
dblp.org
List of computer science publications by Koji Eriguchi.
Publications
Effects of scaling and lattice heating on n-MOSFET performance via...
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The technological advances which have enabled fabrication of devices ever deeper into the submicron regime have left many new and unexplored theoretical...
th International Symposium on Plasma- and Process-Induced...
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Diesen Titel erhalten Sie in einer Bibliothek! th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA....
Emerging Technologies and Circuits | SpringerLink
link.springer.com
With the semiconductor market growth, new Integrated Circuit designs are pushing the limit of the technology and in some cases, require specific fine-tuning of...
Miscellaneous
US B1 - Method of determining the impact of plasma-charging...
patents.google.com
The present invention provides a method of determining a reliability of a semiconductor device. In an exemplary embodiment, the method determines an...
List of Conference Presentations - Technology & Design - About...
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The list of Panasonic's conference presentations, including joint researches, in
DPS th International Symposium on Dry Process
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DPS th International Symposium on Dry Process
Koji Eriguchi | LinkedIn
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View Koji Eriguchi's professional profile on LinkedIn. LinkedIn is the world's largest business network, helping professionals like Koji Eriguchi discover inside ...
EP A3 - Method of manufacturing an aggregate of semiconductor...
patents.google.com
... EP-A , EP A3, EP A3, EP , EP Inventeurs, Koji Eriguchi, Masafumi Kubota, Masaaki Niwa, Noboru Nomura.
Patents - Googlewww.google.com › patents
patents.google.com
Other languages: German: English: French; Inventor: Koji Eriguchi: Kazuichiro Itonaga: Isao Miyanaga: Yoshihiro Mori: Hisashi Ogawa: Takayuki Yamada ...
EP A3 - Semiconductor device comprising an aggregate of...
patents.google.com
Izumitelji, Koji Eriguchi, Masafumi Kubota, Masaaki Niwa, Noboru Nomura. Prijavitelj, Matsushita Electric Industrial Co., Ltd. Izvoz navedbe, BiBTeX, EndNote, ...
[BNC-all] Prof. Koji Eriguchi and Prof. Kazuya Tatsumi ...engineering.purdue.edu › ECN › archives › bnc-all › September
engineering.purdue.edu
... system" (1) KOJI ERIGUCHI, Professor Department of Aeronautics and Astronautics, Kyoto University Kyoto daigaku-Katsura, Nishikyo-ku, ...
Koji Eriguchi
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Koji Eriguchi. Details · Publications ... Kouichi Ono, Hiroaki Ohta, Koji Eriguchi · Thin Solid Films 518 , 13 ,
"Model prediction of stochastic effects of plasma-induced damage in...
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Koji Eriguchi, "Model prediction of stochastic effects of plasma-induced damage in advanced electronic devices" in "International Conference on Semiconductor ...
EP A3 - Dispositif semiconducteur comprenant un agrégat de...
patents.google.com
Inventors, Koji Eriguchi, Masafumi Kubota, Masaaki Niwa, Noboru Nomura. Applicant, Matsushita Electric Industrial Co., Ltd. Export Citation, BiBTeX, EndNote, ...
APS -68th Annual Gaseous Electronics Conference/9th International...
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Koji Eriguchi (Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University). Kouichi Ono (Department of Aeronautics and ...
Eriguchi, JP - Patent applications
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Eriguchi, JP Fuyuki Eriguchi, Osaka JP. Patent application number Description ... Patent applications by Koji Eriguchi, Ritto-Shi JP. Manabu Eriguchi, Kanagawa JP.
DPS th International Symposium on Dry Processwww.dry-process.org information/awards.html
www.dry-process.org
Koji Eriguchi (Kyoto University). DPS2008 Best Paper Award: M. Fukasawa (Sony Corp.) DPS2007 Best Paper Award: G. Delgadino (Lam Research Corp.).
62nd Annual Gaseous Electronics Conference - Event APSmeetings.aps.org › Meeting › GEC09 › Session › KTP
meetings.aps.org
Koji Eriguchi Kouich Ono (Department of Aeronautics and Astronautics, Kyoto University). There has recently been an ongoing trend toward decreasing the ...
AVS 61st International Symposium & Exhibition, Paper SE+NS ...www2.avs.org › symposium2014 › Papers › Paper_SE+NS+TR-TuM3
www2.avs.org
Presenter: Koji Eriguchi, Kyoto University, Japan. Authors: K. Eriguchi, Kyoto University, Japan M. Noma, SHINKO SEIKI CO., LTD., Japan
IEEE Joint Conference ICICDT & 4S-2016
4s.icdrec.edu.vn
Koji Eriguchi and Yuichiro Mitani: 10:50–11:10AM: Session C: ... He has been serving on technical program committees for ISSCC, IEDM, A-SSCC, ISCAS, ...
Committees - ICICDT Home Pagewww.innotechevents.com › ICICDT2018
www.innotechevents.com
2019 Conference Chair Elect, TBD, TBD. Executive Committee Chair, Thuy Dao, . Secretary, Koji Eriguchi, -u.ac.jp.
IEICE Technical Report, vol 116, no 3, 2016
www.ieice.org
Zhiqiang Wei (PSCS), Koji Eriguchi (Kyoto Univ.), Shunsaku Muraoka, Koji Katayama, Ryotaro Yasuhara, Kawai Ken, Yukio Hayakawa, Kazuhiko Shimakawa, ...
Impacts of plasma process-induced damage on MOSFET parameter ...
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Impacts of plasma process-induced damage on MOSFET parameter variability and reliability. Koji Eriguchi, Kouichi Ono · Details · Contributors · Fields of ...
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