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Обсуждение (271) Кремль позитивно отнесся к вызову российского посла...
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Linard Karklin 30 сентября г. в 19:24: На себя посмотри - Путинское быдло. Yuri Trofimoff 30 сентября г. в 7:17: следующая ...
Telephone & Addresses
Linard N Karklin, 68, Cupertino, US, Valley Green Dr, Apt 289
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Linard N Karklin, 68, Mountain View, US, California St, Apt 23
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Linard N Karklin, 68, Palo Alto, US, Wellesley St
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WhitePages: Linard Karklin | Whitepages
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LinkedIn: Linard Karklin | LinkedIn
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linard karklin | OK
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linard karklin 68 лет, Sunnyvale (San Francisco area), СШАПоследний визит: linard karklin получил подарок от Валентина Грехова на День рождения.
Linard Karklin on Etsy
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Interests
Linard Karklin - Patents
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Linard Karklin patents Recent bibliographic sampling of Linard Karklin patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):
Business Profiles
patentbuddy: Linard Karklin
SYNOPSYS, INC., Sunnyvale, CA, US
patentbuddy: Linard N Karklin
SYNOPSYS, INC., Sunnyvale, CA, US
Books & Literature
USPTO Image File Wrapper Petition Decisions 0128
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The applicant requests that the name of Linard Karklin be deleted from the list of inventors as originally filed, namely, Linyong Pang, Daniel William ...
Related Documents
Visual analysis and verification system using advanced tools -...
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A system and method of analyzing defects on a mask used in lithography are provided. A defect area image is provided as a first input, a set of lithography...
Linard Karklin - Academia.edu
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Publications
Dr. Linard Karklin : SPIE.org Profile
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SPIE Profile : Dr. Linard Karklin - the International Society for Optics and Photonics.
Video & Audio
Linard Karklin - YouTube
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Miscellaneous
Linard Karklin | LinkedIn
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US B2 - Two-exposure phase shift photolithography with improved...
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... Gate Patterning ( II): Mask Design and Manufacturing Tolerances. Hua-Yu Liu, Linard Karklin, Yao-Ting Wang and Y.C.Pati: Proc.SPIE, V3334,(1998), pp2-14.
EP A4 - Visual inspection and verification system
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Patents Publication number ... Linard Karklin: Applicant: Synopsys Inc: Export Citation: BiBTeX, EndNote, RefMan: Classifications (29), Legal Events (25) External ...
US B1 - Integrated scheme for semiconductor device verification...
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A method for determining device yield of a semiconductor device design, comprises determining statistics of at least one device parameter from at least...
Linard Karklin Skill Level Tennis Player
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0.35-micron lithography using off-axis illumination - SPIE ...
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by PF Luehrmann Jr · · Cited by 49 — ... Hans Jasper, Sunny Stalnaker, Steve K. Brainerd, J. Brett Rolfson, and Linard Karklin "0.35-μm lithography using off-axis illumination", Proc. by L Karklin · · Cited by 20 — Linard Karklin, Mark M. Altamirano, Lynn Cai, Khoi A. Phan, and Chris A. Spence "Automatic defect severity scoring for 193-nm reticle defect inspection", ... › full › full
US B2 - System and method of providing mask defect printability...
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A simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a...
WO A2 - Visual inspection and verification system
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Applicant, Numerical Tech Inc, Chang Fang Cheng, Wang Yao Ting, Yagyensh C Pati, Linard Karklin. Export Citation, BiBTeX, EndNote, RefMan.
Challenges and Automata Applications in ChipDesign ...
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This talk prepared with my colleagues at Sagantec (Ad van Gestel, Linard Karklin) and in the FASTAR group in Eindhoven+Pretoria (Derrick Kourie, ... › challenges-and-automata-applic...
Edge detection strategies for sub-0.5-micrometer reticle Gale
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by MV Dusa · · Cited by 4 — Authors: Mircea V. Dusa and Linard Karklin. Date: Sept From: Solid State Technology(Vol. 38, Issue 9). Publisher: PennWell Publishing Corp. › i.do
Impact of subwavelength CD tolerance on device performance
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Impact of subwavelength CD tolerance on device performance
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Karklin, US - Patent applications
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Karklin, US Heather Karklin, San Francisco, CA US. Patent application number Description Published; ... Linard Karklin, Sunnyvale, CA US. Patent application number
Layout techniques and rules to reduce process-related variability
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SPIE Digital Library Journals
MICRO: Behind the Mask - Poortinga (June 2000)
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Comparing software and hardware simulation tools on an embedded-attenuated PSM . Eric R ... Linyong Pang, and Linard Karklin, Numerical Technologies ...
Photolithography Process Characterization and 3D Simulation ...
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by S Dutta-Chowdhury · · Cited by 4 — ... Bruce W. Smith, Linard Karklin, "Photolithography process characterization and 3D simulation using track-mounted development rate monitor data", Proc. › other
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Photolithography process characterization and 3D simulation using...
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SPIE Digital Library Proceedings
Ortega Park Tennis Courts in Sunnyvale, CA
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